ASML

What does our next-gen High NA EUV lithography system deliver for chipmakers? In December, the world’s first TWINSCAN EXE:5200B High NA extreme ultraviolet (EUV) lithography system was successfully installed at Intel. Here’s how the system will help bring High NA EUV into high-volume manufacturing: 🔍 With a resolution of 8 nanometers, the system can print the tiniest features on the most advanced microchips. 📏 The system’s unprecedented 0.7 nanometer overlay helps ensure accurate pattern placement as transistor density increases. 🏭 A throughput of 175 wafers per hour means the system can expose wafers fast enough to meet the demands of volume production. With this performance, the EXE:5200B will reduce chipmakers’ complexity, cost, cycle time and energy consumption so they can continue to drive affordable scaling and keep Moore’s Law alive.

What happens inside a lithography system? 🤔 Chipmakers can't watch chip patterns being printed, but they still need to understand and control the patterning process. That’s where models and measurements come in: By giving chipmakers deep insights into what’s happening in their lithography systems, these techniques enable the critical layers in today’s advanced microchips.

🚨 BREAKING: We just reported our Q4 2025 and full-year 2025 financial results! 👇 📈 Our full-year 2025 total net sales were €32.7 billion, including €9.7 billion in the fourth quarter — a particularly strong period for ASML that included the revenue recognized for two High NA systems. 🤝 "In the last months, many of our customers have shared a notably more positive assessment of the medium-term market situation, primarily based on more robust expectations of the sustainability of AI-related demand. This is reflected in a marked step-up in their medium-term capacity plans and in our record order intake,” said ASML President and Chief Executive Officer Christophe Fouquet. ➡️ "Therefore, we expect 2026 to be another growth year for ASML's business, largely driven by a significant increase in EUV sales and growth in our installed base business sales” Fouquet said. “We continue to invest in people and footprint to support that growth in 2026 and beyond.” 📊 In 2026, we expect first-quarter total net sales between €8.2 billion and €8.9 billion. We expect R&D costs of around €1.2 billion and SG&A costs of around €0.3 billion. 🔉 “For the full year 2026, we expect total net sales to be between €34 billion and €39 billion, with a gross margin between 51% and 53%," Fouquet said.

Developing and manufacturing a microchip is not only incredibly complex – it also requires significant capital investment. So, once a chip goes into mass production, chipmakers need to produce as many good chips as possible to keep the technology they power affordable. That’s why, at ASML, we help chipmakers maximize one of their key metrics: yield.

Transistors – tiny electrical switches that enable chips to process and store information – are at the heart of all electronic devices. Since their invention in the mid-20th century, transistors have had to evolve to meet the exploding demand for computing power. Here are three revolutionary transistor architectures that have enabled our technological world. 🖥️ Planar field effect transistors (FETs) were industrialized in the 1950s and 60s. The design gave rise to Moore’s Law by making possible the mass production and miniaturization of transistors. 🦈 FinFETs, so named because their channels stick up like a fin from the previously planar structure, were commercialized around 2010. They kept Moore’s Law alive by improving performance and reducing issues such as leakage caused by shrinking planar transistors. 🚪 Gate all around (GAA) FETs are now taking FinFET to the next level. By replacing the ‘fin’ with stacks of nanosheets, GAAFETs further improve current control and performance and enable chip-specific optimization. And transistor innovation will continue, improving chip performance and efficiency in the years to come.

The power of extreme ultraviolet (EUV) lithography lies in its ability to fit billions of nanoscale transistors into a single microchip. With a resolution of just 13 nanometers, our EUV systems push precision printing to the next level – orders of magnitude smaller than the densest book you can find – to power the devices you rely on every day.

Chipmakers and photographers both strive to make good images, and they tweak some of the same parameters – focus, contrast and exposure – to get there. But their ideas of what makes an image ‘good’ can differ. Read about what chipmakers need from their images to make the nanoscale features behind today’s chip technology.

In this Bloomberg video, ASML’s role in the semiconductor ecosystem comes into focus as rising AI demand pushes the limits of computing power. By enabling ever-smaller circuits and more efficient chips at scale, advances in lithography help turn that demand into real technological progress. 🚀 Watch now: http://ms.spr.ly/6043tNWXD

How do you build a machine that some in the industry argued should never work? 🤯 In this documentary, Veritasium traces the history of EUV from early proof-of-concept work by pioneers like Hiroo Kinoshita to the point where it could be developed into a working lithography system. It shows how deepening our understanding of fundamental physics allowed us to tackle the engineering challenges over decades. It’s a story about persistence, and what it takes to make the seemingly impossible possible. 🚀

Bloomberg's Tom Mackenzie visited Veldhoven to speak with our CEO Christophe Fouquet about ASML’s foundational role in the chip ecosystem, the pace of AI innovation and how ASML is prepared to meet rising AI demand. Watch the full conversation: http://ms.spr.ly/6049tofE1